magnetron sputtering
常见例句
- Deposition rate is an important parameter in magnetron sputtering and influenced by many factors.
沉積速率是磁控濺射鍍膜技術中的一項重要指標，它由許多因素決定。 - The thickness uniformity of films deposited by planar magnetron sputtering target was analyzed theoretically.
從理論上分析了平麪磁控濺射靶沉積薄膜的厚度均勻性。 - The development, principle and applications of magnetron sputtering technique are introduced in this paper.
該文介紹了磁控濺射沉積技術的基本原理、發展及應用。 返回 magnetron sputtering